9DKKKLVB
Brand: Heidelberg Instruments
Category: Maskless Laser Lithography
Industry: Academia, Material Science & Chemistry, Paint, Pigments & Polymers
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules
The µMLA Maskless Lithography System is a compact, high-performance tabletop solution designed for advanced microfabrication, research, and rapid prototyping. Built on the proven µPG platform — the world’s best-selling maskless tabletop lithography technology — the µMLA enables precise micro-patterning without the need for traditional photomasks, making it a flexible and cost-effective solution for modern laboratories and research facilities.
Engineered for universities, semiconductor research labs, and innovation-driven R&D environments, the µMLA system allows scientists and engineers to quickly transform digital designs into highly accurate microstructures. It is widely used across applications such as microfluidics (lab-on-a-chip and cell sorting devices), MEMS fabrication, micro-optics, microlens arrays, sensor development, small-scale mask writing, and patterning of 2D materials or fan-out electrodes.
The system offers multiple exposure modes for maximum flexibility. The standard Raster Scan Mode ensures rapid exposure while maintaining consistent pattern quality regardless of structure size or pattern density. For applications requiring smooth and continuous curves, the optional Vector Scan Mode provides exceptional precision, making it particularly suitable for structures such as optical waveguides and complex micro-optical devices.
To accommodate different research requirements, the µMLA provides three configurable optical setups, allowing users to easily balance resolution and throughput depending on the specific fabrication task. Additional advanced features further enhance the system’s versatility. The Draw Mode enables users to modify patterns directly in real time and precisely place electrical contacts on nanowires or 2D materials. Meanwhile, the Grayscale Mode supports the fabrication of 2.5D microstructures, which is especially valuable in micro-optics and advanced device design.
Despite its powerful capabilities, the µMLA maintains a compact footprint that fits conveniently on a standard laboratory workbench, making it an excellent entry-level lithography system for laboratories seeking professional-grade performance without the complexity or space requirements of large lithography tools.
Labindia Instruments Pvt. Ltd. is the authorised dealer in India, providing advanced maskless lithography systems along with technical support and application expertise for research institutions, semiconductor labs, and innovation centers.
| Write Mode I * | Write Mode II * | Write Mode III * | |
|---|---|---|---|
| Writing performance (Raster Scan Exposure Module) | |||
| Minimum structure size [μm] | 0.6 | 1 | 3 |
| Minimum lines and spaces [μm] | 0.8 | 1.5 | 3 |
| Address grid [nm] | 20 | 50 | 100 |
| CD uniformity [3σ, nm] | 200 | 300 | 400 |
| 2nd layer alignment over 5 x 5 mm² [nm] | 500 | 500 | 1000 |
| 2nd layer alignment over 50 x 50 mm² [nm] | 1000 | 1000 | 2000 |
| Write speed | with 390 nm LED / 365 nm LED | with 390 nm LED / 365 nm LED | with 390 nm LED |
| Write speed | 10 mm²/min at 0.6 µm | 40 mm²/min at 1 µm | 100 mm²/min at 3 µm |
| Optional write speeds at different minimum structure sizes with “Variable Resolution for Raster Scan Exposure Module” | 18 mm²/min at 1 µm | 60 mm²/min at 2 µm | 160 mm²/min at 4 µm |
| 25 mm²/min at 2 µm | 90 mm²/min at 4 µm | 240 mm²/min at 6 µm | |
| Writing performance (Vector Mode Exposure Module) | |||
| Minimum feature size [µm] | 0.6 | 1 | 3 |
| Address grid [nm] | 20 | 20 | 20 |
| 2nd layer alignment over 5 x 5 mm² [nm] | 500 | 500 | 1000 |
| 2nd layer alignment over 50 x 50 mm² [nm] | 1000 | 1000 | 2000 |
| Maximum linear write speed in Vector Mode | 200 mm/s | 200 mm/s | 200 mm/s |
| Available spot sizes in Vector Mode [µm] | 0.6 / 1 / 2 / 5 / 10 | 1 / 2 / 5 / 10 / 25 | 3 / 5 / 10 / 25 /50 |
| System specifications | |||
| Maximum substrate size | 6″ x 6″ | ||
| Minimum substrate size | 5 x 5 mm2 | ||
| Substrate thickness | 0.1 to 12 mm | ||
| Maximum write area | 150 x 150 mm2 |
| Raster scan exposure module | Vector exposure module | |
|---|---|---|
| Light source | LED; 390 nm or 365 nm | Laser; 405 nm and/or 375 nm |
| System dimensions (lithography unit) | ||
| µMLA | Width x Depth | Height x Weight |
| Main system housing | 640 mm (25") x 840 mm (33") | 530 mm (21") x 130 kg (285 lbs) |
| Installation requirements | ||
| Electrical | 230 VAC / 6A or 110 VAC / 12A (±5%, 50/60 Hz) | |
| Compressed air | 6 - 10 bar | |
| Cleanroom | ISO 6 recommended | |
| Temperature stability | ±1 °C | |
| * Only one write mode can be installed on the system |
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