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Brand: Park Systems
Category: Microscope - Atomic Force
Industry: Academia, Semiconductors, Material Science & Chemistry, Paint, Pigments & Polymers
The most advanced AFM for small samples
The Park FX40 represents the latest advancement from Park Systems in atomic force microscopy (AFM), engineered to deliver exceptional high-resolution imaging for small and delicate samples. Designed with a low noise floor, minimal thermal drift, and superior mechanical stability, the FX40 ensures highly accurate, repeatable nanoscale measurements for advanced research and metrology applications.
Like all Park AFMs, the FX40 incorporates an orthogonal scan system and proprietary True Non-contact™ mode, enabling precise, non-destructive imaging even on fragile or sensitive materials. This ensures accurate topographical and dimensional analysis without compromising sample integrity, making it ideal for semiconductor research, materials science, nanotechnology, and academic laboratories.
The FX40 enhances productivity through intelligent automation features, including automatic probe exchange, automatic laser beam alignment, and an integrated sample-view camera. These signature capabilities of the FX-series AFMs simplify setup, reduce operator dependency, and improve workflow efficiency.
Powered by the advanced FX AFM controller, featuring an 8-channel lock-in amplifier and 5 MHz bandwidth, the system supports sophisticated signal processing and a wide range of advanced imaging modes. This enables researchers to perform complex nanoscale analysis with high precision and flexibility.
Combining cutting-edge performance with user-friendly operation, the Park FX40 is an ideal solution for laboratories seeking reliable, high-resolution AFM imaging and nanoscale characterization with maximum efficiency.
| Application Images | Description | Scanning Conditions |
|
Twisted Bilayer Graphene on hBN: A Twisted Bilayer Graphene on hBN was measured in Conductive AFM to acquire current image. The image shows the morie pattern between Twisted bilayer graphene and hexagonal boron nitride. |
- System: Park FX40 - Scan Mode: Conductive AFM (Channel: Current) - Scan Rate: 3 Hz - Scan Size: 100 µm × 100 µm - Pixel Size: 256 × 256 pixels |
|
| Polymer Composite: |
- System: Park FX40 - Scan Mode: True Non-contact™ mode - Scan Rate: 0.5 Hz - Scan Size: 10 µm × 10 µm - Pixel Size: 512 × 512 pixels - Peak-to-valley: 8.2 nm |
|
| Block Copolymer: A Block Copolymer was measured in True Non-contact™ mode to acquire surface topography. The scan data revealed a peak-to-valley height difference of 150nm, and the image shows the floral-pattern of the Block Copolymer. | - System: Park FX40 - Scan Mode: True Non-contact™ mode - Scan Rate: 0.3 Hz - Scan Size: 40 µm × 40 µm - Pixel Size: 256 × 256 pixels - Peak-to-valley: 150 nm |
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| WTe₂ on Au Electrode: A WTe2 on Au Electrode was measured in Conductive AFM to acquire current image. The scan data revealed a peak-to-valley height difference of 158 µA, and the image shows the Conductance distribution of WTe2 on Au Electrode. |
- System: Park FX40 - Scan Mode: Conductive AFM (Channel: Current) - Scan Rate: 1 Hz - Scan Size: 30 µm × 30 µm - Pixel Size: 1024 × 256 pixels - Peak-to-valley: 158 µA |
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