SINDRE® Integra tool offer customers access to Obducat’s second‑generation SINDRE nanoimprint lithography (NIL) production platform, designed for reliable, scalable, and cost‑efficient manufacturing of nano‑ and micro‑structured devices. The SINDRE® Integra is optimized for high‑volume production environments, combining advanced automation with industry‑proven NIL process technologies to ensure consistent performance and excellent pattern fidelity.
At the core of the SINDRE‑2 platform are Obducat’s patented SoftPress® and Intermediate Polymer Stamp (IPS®) technologies. SoftPress® applies imprint pressure using controlled gas distribution, enabling uniform contact across the entire substrate surface and compensating for bow, thickness variations, or surface unevenness. This results in highly uniform imprints with thin residual layers, supporting superior pattern transfer and downstream processing yield.
The IPS® technology enhances process stability and cost‑of‑ownership by protecting the master stamp and reducing defectivity caused by contamination or substrate surface imperfections. By using a flexible, transparent intermediate stamp manufactured within the system, SINDRE‑2 enables longer stamp lifetimes, higher repeatability, and a broader process window for both UV‑ and thermal‑based nanoimprint processes.
Through Obducat’s foundry services, customers can leverage SINDRE‑2 for pilot production, process verification, and continuous volume manufacturing without the need to invest in their own NIL production infrastructure. The service supports substrate sizes up to 200 mm and is suitable for applications across optics and photonics, LEDs and Micro‑LEDs, MEMS and sensors, fluidics, and biomedical devices. High throughput and automation enable consistent quality at competitive manufacturing costs, making SINDRE‑2 an effective solution for both fabless and scaling customers.
