SENTECH ICPECVD Systems
AKD8REOU
Brand: Sentech
Category: Plasma Process Technology
Industry: Material Science & Chemistry, Semiconductors, Academia
Labindia Instruments is an authorized distributor of SENTECH ICPECVD Systems, delivering next-generation thin film deposition technology with high plasma density and superior film quality. Inductively Coupled PECVD (ICPECVD) enables low-temperature deposition of dense, uniform films with minimal substrate damage. This advanced technology is ideal for sensitive substrates where precision and material integrity are critical. Compared to conventional PECVD, ICPECVD ensures better adhesion, fewer defects, and enhanced performance. It is the preferred choice for high-end applications requiring consistent, high-quality thin film outcomes.
- Deposition of dielectric films, SiC, amorphous silicon, TEOS.
- Direct load
- Capacitively coupled plasma source with shower head
- Low-frequency mixing for stress control
- Endpoint monitors (SENTECH Laser Interferometer and OES)
- Remote servicing
- Small footprint
- Especially suited to low-temperature and low-damage stress controlled deposition of SiO2, Si3N4, SiOXNY, SiC, a-Si, TEOS-SiO2.
- SENTECH Planar Triple Spiral Antenna (PTSA) ICP source
- Dynamic substrate temperature control
- Stress control by ICP power, pressure and gas flow
- Mechanical clamping up to 200 mm wafer diameter
- Processing of single and multiple wafers on carrier with He backside cooling
- Endpoint monitors (SENTECH Laser Interferometer and OES)
