Multi-User Tool For 3D Lithography And 3D Microprinting
The MPO 100 is a Two-Photon Polymerization (TPP) Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micromechanics and biomedical engineering. The modular 3D printing platform MPO 100 offers high precision on demand for 3D Lithography as well as high print volume for 3D Microprinting and enables production of complex functional microstructures with high throughput in a single process step.
The MPO 100 includes a powerful femtosecond laser system operating at a wavelength of 522 nm, thereby enabling efficient and high-speed processing of many commercially available polymer systems. Among those is the industry-proven class of inorganic-organic hybrid polymers known as ORMOCER®. This class of materials provides unique optical, mechanical and chemical properties. In addition, as many photoresists exhibit high sensitivity at the 522 nm TPP wavelength the MPO 100 is an ideal tool for R&D to develop new material systems.
1 – 10 – 100 – 1000
Application-specific write modes enable fast and easy switching between 3D Lithography and 3D Microprinting. Macro structures with a height of over 1 cm can be fabricated as well as micro structures with superior surface quality exhibiting a roughness of down to 10 nm. The achievable minimum feature size of down to 100 nm and the accessible scan speed of over 1000 mm/s provide full user benefit for tailored 3D nano-, micro- and macro fabrication processes.
Product Highlights :
Printing Height
Structures taller than 1 cm
Surface quality
Smooth surfaces with roughness down to 10 nm
High-Resolution Print
Feature sizes smaller than 100 nm
High-speed 3D microfabrication
High scan speeds over 1000 mm/s
Stable printing environment
Temperature controlled flowbox down to ± 0.1 °C with ISO 4 environment
Large printing area
Print area of 100 x 100 mm2
Stitching-free fabrication
Synchronized scanning system enables stitching-free fabrication
Versatility
Various exposure and write modes tailored to the specific applications
Industry-proven materials
High-speed processing of ORMOCER®s (hybrid polymers) and other photoresists
User-friendly
Optional software modules for customer-specific print jobs
Technical Data
| Performance | |
| Print height (max.) | ≥ 1 cm |
| Roughness (min.) | ≤ 10 nm |
| Minimum feature size | ≤ 100 nm (lateral) |
| Scan speed (max.) | 10 m/s divided by magnification (e.g. 1000 mm/s for 10x) |
| Materials (additive or subtractive) | ORMOCER®s, SU-8, customer-specific resins, AZ-series,ma-P 1200, metal layers (e.g. Ag, Au, Cr, ...) |
| Structuring modes | Scan-and-Step with advanced stitching algorithms Stage only for stitching-free fabrication Synchronized Infinite Field-of-View (IFoV) for stitching-free fabrication |
| System features | |
| Laser | λ = (522 ± 3) nm τpulse ≤ 250 fs frep = (63 ± 0.6) MHz Pmean ≥ 600 mW Epulse > 10 nJ |
| Laser power at focusing optics (max.) | ≥ 200 mW |
| Focusing optics | Numerical aperture: 0.2 (air) to 1.4 (immersion) Magnification: 5x to 100x Field-of-View (FoV): up to 2 mm |
| Print area | 100 x 100 mm2 |
| Autofocus | Optical detection of interfaces down to 20 nm |
| Substrate | Size: up to 6" (4" process area), Thickness: up to 4 cm |
| Software | LithoSoft3D (code generation software) LithoStream (system control software) |
| Scanning system | |
| Temperature controlled flow box | Control down to ± 0.1°, ISO Class 4 cleanroom environment |
| System dimensions (TPP unit) | |
| Footprint | 1300 mm × 1100 mm × 1950 mm |
| Weight | < 1000 kg |
| Installation requirements | |
| Electrical | 115/230 V, 50/60 Hz, 16 A |
| Optimum lab conditions | Temperature: 21 °C ± 1 °C Humidity: 40 – 80 % non-condensing |
| Compressed air | 6 - 8 bar, stability ± 0.5 bar |
| Room lighting | Yellow light |